advances in imaging and electron physics optics of charged particle analyzers 157

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Advances In Imaging And Electron Physics

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ISBN : 9780080912165
Genre : Technology & Engineering
File Size : 42. 58 MB
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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. * Contributions from leading international scholars and industry experts * Discusses hot topic areas and presents current and future research trends * Invaluable reference and guide for physicists, engineers and mathematicians

Advances In Imaging And Electron Physics

Author : Peter W. Hawkes
ISBN : 0120147483
Genre : Science
File Size : 63. 22 MB
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Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Advances In Imaging And Electron Physics

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ISBN : 9780123859846
Genre : Technology & Engineering
File Size : 49. 61 MB
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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Contributions from leading international scholars and industry experts Discusses hot topic areas and presents current and future research trends Invaluable reference and guide for physicists, engineers and mathematicians

The British National Bibliography

Author : Arthur James Wells
ISBN : STANFORD:36105211722686
Genre : English literature
File Size : 25. 67 MB
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Science Of Microscopy

Author : Peter Hawkes
ISBN : 9780387497624
Genre : Technology & Engineering
File Size : 27. 77 MB
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This fully corrected second impression of the classic 2006 text on microscopy runs to more than 1,000 pages and covers up-to-the-minute developments in the field. The two-volume work brings together a slew of experts who present comprehensive reviews of all the latest instruments and new versions of the older ones, as well as their associated operational techniques. The chapters draw attention to their principal areas of application. A huge range of subjects are benefiting from these new tools, including semiconductor physics, medicine, molecular biology, the nanoworld in general, magnetism, and ferroelectricity. This fascinating book will be an indispensable guide for a wide range of scientists in university laboratories as well as engineers and scientists in industrial R&D departments.

Fundamentals Of Light Microscopy And Electronic Imaging

Author : Douglas B. Murphy
ISBN : 9781118382936
Genre : Medical
File Size : 54. 92 MB
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Fundamentals of Light Microscopy and Electronic Imaging, Second Edition provides a coherent introduction to the principles and applications of the integrated optical microscope system, covering both theoretical and practical considerations. It expands and updates discussions of multi-spectral imaging, intensified digital cameras, signal colocalization, and uses of objectives, and offers guidance in the selection of microscopes and electronic cameras, as well as appropriate auxiliary optical systems and fluorescent tags. The book is divided into three sections covering optical principles in diffraction and image formation, basic modes of light microscopy, and components of modern electronic imaging systems and image processing operations. Each chapter introduces relevant theory, followed by descriptions of instrument alignment and image interpretation. This revision includes new chapters on live cell imaging, measurement of protein dynamics, deconvolution microscopy, and interference microscopy. PowerPoint slides of the figures as well as other supplementary materials for instructors are available at a companion website: www.wiley.com/go/murphy/lightmicroscopy

Theory And Design Of Charged Particle Beams

Author : Martin Reiser
ISBN : 9783527617630
Genre : Science
File Size : 68. 71 MB
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Although particle accelerators are the book's main thrust, it offers a broad synoptic description of beams which applies to a wide range of other devices such as low-energy focusing and transport systems and high-power microwave sources. Develops material from first principles, basic equations and theorems in a systematic way. Assumptions and approximations are clearly indicated. Discusses underlying physics and validity of theoretical relationships, design formulas and scaling laws. Features a significant amount of recent work including image effects and the Boltzmann line charge density profiles in bunched beams.

Electron Microscopy And Analysis Third Edition

Author : Peter J. Goodhew
ISBN : 0748409688
Genre : Technology & Engineering
File Size : 29. 62 MB
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Electron Microscopy and Analysis deals with several sophisticated techniques for magnifying images of very small objects by large amounts - especially in a physical science context. It has been ten years since the last edition of Electron Microscopy and Analysis was published and there have been rapid changes in this field since then. The authors have vastly updated their very successful second edition, which is already established as an essential laboratory manual worldwide, and they have incorporated questions and answers in each chapter for ease of learning. Equally as relevant for material scientists and bioscientists, this third edition is an essential textbook.

Handbook Of Charged Particle Optics

Author : Jon Orloff
ISBN : 0849325137
Genre : Science
File Size : 61. 2 MB
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This timely handbook contains chapters on the essential elements of high resolution charged particle optics and is written by many of the world's leading research scientists. It is a complete guide to understanding, designing, and using high resolution instrumentation such as transmission electron microscopes (TEMs), scanning electron microscopes (SEMs), scanning transmission electron microscopes (STEMs), and focused ion beam (FIB) systems. This handbook is evenly balanced between theory and application, and covers all the most important topics in this growing area. Handbook of High Resolution Charged Particle Optics explains how and why high resolution instruments work and how to apply this information when designing or using them.

Electron And Ion Optics

Author : Miklos Szilagyi
ISBN : 9781461309239
Genre : Technology & Engineering
File Size : 41. 88 MB
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The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.

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