compact plasma and focused ion beams

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Compact Plasma And Focused Ion Beams

Author : Sudeep Bhattacharjee
ISBN : 9781466557925
Genre : Science
File Size : 55. 78 MB
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Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.

Issues In Nuclear High Energy Plasma Particle And Condensed Matter Physics 2011 Edition

Author :
ISBN : 9781464963650
Genre : Science
File Size : 54. 47 MB
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Issues in Nuclear, High Energy, Plasma, Particle, and Condensed Matter Physics: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Nuclear, High Energy, Plasma, Particle, and Condensed Matter Physics. The editors have built Issues in Nuclear, High Energy, Plasma, Particle, and Condensed Matter Physics: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Nuclear, High Energy, Plasma, Particle, and Condensed Matter Physics in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Issues in Nuclear, High Energy, Plasma, Particle, and Condensed Matter Physics: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at

Photon Beam And Plasma Assisted Processing

Author : E.F. Krimmel
ISBN : 9780444596369
Genre : Science
File Size : 58. 71 MB
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This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.

High Power Particle Beams Beams 90 Proceedings Of The 8th International Conference In 2 Volumes

Author : Breizman B N
ISBN : 9789814579216
Genre :
File Size : 25. 94 MB
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Introduction To Focused Ion Beam Nanometrology

Author : David C. Cox
ISBN : 9781681741482
Genre : Science
File Size : 41. 57 MB
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This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Plasmas And Fluids

Author : Panel on the Physics of Plasmas and Fluids
ISBN : 9780309542203
Genre : Science
File Size : 38. 46 MB
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Beam Processing Technologies

Author : Norman G. Einspruch
ISBN : 9781483217857
Genre : Technology & Engineering
File Size : 77. 8 MB
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Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

Micropropulsion For Small Spacecraft

Author : Michael Matthew Micci
ISBN : 1600864392
Genre : Electronic book
File Size : 61. 41 MB
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Emerging Applications Of Vacuum Arc Produced Plasma Ion And Electron Beams

Author : Efim Oks
ISBN : 1402010656
Genre : Science
File Size : 59. 95 MB
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The NATO-sponsored Advanced Research Workshop (ARW) on "Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams" was held at the Baikal Dunes Resort, Lake Baikal, Russia, on June 24-28, 2002. Participants were from NATO countries Belgium, Czech Republic, Germany, Poland, Turkey and the USA, and from NATO partner countries Bulgaria, Russia, Ukraine and Uzbekistan. The goal of the meeting was to bring together researchers involved in novel applications of plasmas and ion/electron beams formed from vacuum arc discharges, especially in less conventional or emerging scientific areas such as new perspectives on vacuum arc phenomena, generation of high charge state metal ions, heavy ion accelerator injection, multi-layer thin film synthesis, biological applications, generation of high-current high-density electron beams, and more. It was our hope that the meeting would engender new research directions and help to establish new collaborations, prompt new thinking for research and technology applications of vacuum arc science, and in general foster development of the field. The Workshop was a great success, as was clearly felt by all of the attendees. The small number of participants at the meeting tended to encourage a high level of closeness and communication between individuals. The location, a small resort on the western side of Lake Baikal in the vicinity of Irkutsk, was ideal - the isolated location, small and quiet, was excellent and was most conducive to discussion among individuals and small groups quite apart from the formal presentations.

Introduction To Plasma Technology

Author : John Ernest Harry
ISBN : 9783527643707
Genre : Science
File Size : 60. 60 MB
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Written by a university lecturer with more than forty years experience in plasma technology, this book adopts a didactic approach in its coverage of the theory, engineering and applications of technological plasmas. The theory is developed in a unified way to enable brevity and clarity, providing readers with the necessary background to assess the factors that affect the behavior of plasmas under different operating conditions. The major part of the book is devoted to the applications of plasma technology and their accompanying engineering aspects, classified by the various pressure and density regimes at which plasmas can be produced. Two chapters on plasma power supplies round off the book. With its broad range of topics, from low to high pressure plasmas, from characterization to modeling, and from materials to components, this is suitable for advanced undergraduates, postgraduates and professionals in the field.

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