handbook of chemical vapor deposition principles technology and applications cvd principles technology and applications

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Handbook Of Chemical Vapor Deposition

Author : Hugh O. Pierson
ISBN : 9781437744880
Genre : Technology & Engineering
File Size : 67. 94 MB
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Handbook Of Chemical Vapor Deposition Cvd

Author : Hugh O. Pierson
ISBN : 0815513003
Genre : Technology & Engineering
File Size : 28. 52 MB
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A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and monolithic components. It presents a clear, objective, systematic assessment of CVD, including an e

Handbook Of Chemical Vapor Deposition 2nd Edition

Author : Hugh O. Pierson
ISBN : 0080946682
Genre : Technology & Engineering
File Size : 49. 12 MB
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Handbook Of Chemical Vapor Depostion I E Deposition Cvd

Author : Hugh O. Pierson
ISBN : 0815514328
Genre : Technology & Engineering
File Size : 30. 72 MB
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Since the publication of the first edition of the Handbook of Chemical Vapor Deposition (CVD) in early 1992, the technology has developed at a rapid rate and the number and scope of its applications and their impact of the market have increased considerably. This process is now a key factor in many industries such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters and many others. The size of the CVD market today (1999) is estimated to be at least double that of the market seven years ago. This second edition of the Handbook is an update with a considerably expanded and revised scope.

Chemical Vapor Deposition

Author : Jong-Hee Park
ISBN : 9781615032242
Genre : Technology & Engineering
File Size : 72. 82 MB
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Inorganic Reactions And Methods Formation Of Ceramics

Author : Jim D. Atwood
ISBN : 9780470145548
Genre : Science
File Size : 55. 5 MB
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Boasting numerous industrial applications, inorganic chemistry forms the basis for research into new materials and bioinorganic compounds such as calcium that act as biological catalysts. Now complete, this highly acclaimed series presents current knowledge in all areas of inorganic chemistry, including chemistry of the elements; organometallic, polymeric and solid-state materials; and compounds relevant to bioinorganic chemistry.

Cvd Polymers

Author : Karen K. Gleason
ISBN : 9783527337996
Genre : Science
File Size : 42. 45 MB
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The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.

Handbook Of Thin Film Deposition Processes And Techniques

Author : Klaus K. Schuegraf
ISBN : UOM:39015012052265
Genre : Technology & Engineering
File Size : 47. 3 MB
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The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.

Chemical Vapour Deposition

Author : Xiu-Tian Yan
ISBN : 1848828942
Genre : Technology & Engineering
File Size : 53. 56 MB
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"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.

Handbook Of Thin Film Technology

Author : Hartmut Frey
ISBN : 9783642054303
Genre : Technology & Engineering
File Size : 58. 91 MB
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“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

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