lecture notes on principles of plasma processing

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Lecture Notes On Principles Of Plasma Processing

Author : Francis F. Chen
ISBN : 9781461501817
Genre : Science
File Size : 39. 21 MB
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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Plasma Etching

Author : M. Sugawara
ISBN : 0191590290
Genre : Technology & Engineering
File Size : 68. 36 MB
Format : PDF
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Glow Discharge Processes

Author : Brian Chapman
ISBN : UOM:39015040316237
Genre : Science
File Size : 30. 25 MB
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Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Plasma Processes For Semiconductor Fabrication

Author : W. N. G. Hitchon
ISBN : 0521018005
Genre : Technology & Engineering
File Size : 66. 51 MB
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Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

Principles Of Plasma Discharges And Materials Processing

Author : Michael A. Lieberman
ISBN : 9780471724247
Genre : Science
File Size : 57. 88 MB
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A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

An Indispensable Truth

Author : Francis Chen
ISBN : 1441978208
Genre : Science
File Size : 89. 12 MB
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Recent books have raised the public consciousness about the dangers of global warming and climate change. This book is intended to convey the message that there is a solution. The solution is the rapid development of hydrogen fusion energy. This energy source is inexhaustible and, although achieving fusion energy is difficult, the progress made in the past two decades has been remarkable. The physics issues are now understood well enough that serious engineering can begin.The book starts with a summary of climate change and energy sources, trying to give a concise, clear, impartial picture of the facts, separate from conjecture and sensationalism. Controlled fusion -- the difficult problems and ingenious solutions -- is then explained using many new concepts.The bottom line -- what has yet to be done, how long it will take, and how much it will cost -- may surprise you. Francis F. Chen's career in plasma has extended over five decades. His textbook Introduction to Plasma Physics has been used worldwide continuously since 1974. He is the only physicist who has published significantly in both experiment and theory and on both magnetic fusion and laser fusion. As an outdoorsman and runner, he is deeply concerned about the environment. Currently he enjoys bird photography and is a member of the Audubon Society.

Plasma Etching

Author : Dennis M. Manos
ISBN : 9780080924465
Genre : Science
File Size : 35. 85 MB
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Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

Dry Etching Technology For Semiconductors

Author : Kazuo Nojiri
ISBN : 9783319102955
Genre : Technology & Engineering
File Size : 39. 28 MB
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This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

Plasma Technology For Hyperfunctional Surfaces

Author : Hubert Rauscher
ISBN : 3527630465
Genre : Technology & Engineering
File Size : 39. 8 MB
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Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes.

Introduction To Plasma Physics And Controlled Fusion

Author : Francis Chen
ISBN : 9783319223094
Genre : Science
File Size : 26. 71 MB
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This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons. For the third edition, updates was made throughout each existing chapter, and two new chapters were added; Ch 9 on “Special Plasmas” and Ch 10 on Plasma Applications (including Atmospheric Plasmas).

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