materials analysis by ion channeling submicron crystallography

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Materials Analysis By Ion Channeling

Author : Leonard C. Feldman
ISBN : 9780323139816
Genre : Technology & Engineering
File Size : 63. 60 MB
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Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

Materials Science With Ion Beams

Author : Harry Bernas
ISBN : 9783540887898
Genre : Technology & Engineering
File Size : 29. 46 MB
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Materials science is the prime example of an interdisciplinary science. It - compasses the ?elds of physics, chemistry, material science, electrical en- neering, chemical engineering and other disciplines. Success has been o- standing. World-class accomplishments in materials have been recognized by NobelprizesinPhysicsandChemistryandgivenrisetoentirelynewtechno- gies. Materials science advances have underpinned the technology revolution that has driven societal changes for the last ?fty years. Obviouslytheendisnotinsight!Futuretechnology-basedproblemsd- inatethecurrentscene.Highonthelistarecontrolandconservationofenergy and environment, water purity and availability, and propagating the inf- mation revolution. All fall in the technology domain. In every case proposed solutions begin with new forms of materials, materials processing or new arti?cial material structures. Scientists seek new forms of photovoltaics with greater e?ciency and lower cost. Water purity may be solved through surface control, which promises new desalination processes at lower energy and lower cost. Revolutionary concepts to extend the information revolution reside in controlling the “spin” of electrons or enabling quantum states as in quantum computing. Ion-beam experts make substantial contributions to all of these burgeoning sciences.

Ion Implantation And Synthesis Of Materials

Author : Michael Nastasi
ISBN : 9783540452980
Genre : Science
File Size : 42. 6 MB
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Surface Science

Author : K. Oura
ISBN : 9783662051795
Genre : Science
File Size : 83. 41 MB
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The most important aspects of modern surface science are covered. All topics are presented in a concise and clear form accessible to a beginner. At the same time, the coverage is comprehensive and at a high technical level, with emphasis on the fundamental physical principles. Numerous examples, references, practice exercises, and problems complement this remarkably complete treatment, which will also serve as an excellent reference for researchers and practitioners. The textbook is idea for students in engineering and physical sciences.

Relativistic Channeling

Author : R. A. Carrigan
ISBN : 0306426897
Genre : Science
File Size : 76. 76 MB
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Channeling, by its nature, involves a wide and disparate range of disciplines. Crystal preparation, material science, accelerator physics, sophisticated theoretical analysis and, of course, channeling itself all must work in concert in a research program. In spite of the gulfs separating some of these activities, researchers have drawn together over the last decade to carry out remarkable experiments in relativistic channeling and channeling radiation. Several informal workshops on high-energy channeling have been held over ~he years at Aarhus and Fermilab. However, with the vigorous progress in the field in the last several years it became clear that a more formal, comprehensive workshop was needed along with a book that covered the whole spectrum of the new developments, probed the future, and also laid out some of the foundations of the subject. This volume is the outcome of that process. The organization and preparation of both the volume and the workshop owe much to several outstanding scientific committees. The membership of these included J. Andersen (Aarhus), S. Baker (Fermilab), B. Berman (G. Washington), G. Bologna (Torino), E. Bonderup (Aarhus), S. Datz (Oak Ridge), J. Forster (Chalk River), F. Fujimoto (Tokyo), W. Gibson (Albany), I. Mitchell (Chalk River), Y. Ohtsuki (Waseda), R. Pantell (Stanford), S. Picraux (Sandia), J. Remillieux (Lyon), A. Saenz (NRL), V. Schegelsky (Gatchina), C. Sun (Albany), H. tiberall (Catholic U. ), E. Uggerh¢j (CERN), and R. Wedell (Humboldt). Others from across the spectrum of scientific disciplines agreed to serve as session chairmen.

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