principles of plasma diagnostics

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Principles Of Plasma Diagnostics

Author : I. H. Hutchinson
ISBN : 052167574X
Genre : Medical
File Size : 71. 17 MB
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This book provides a systematic introduction to the physics behind measurements on plasmas. It develops from first principles the concepts needed to plan, execute, and interpret plasma diagnostics. The book is therefore accessible to graduate students and professionals with little specific plasma physics background, but is also a valuable reference for seasoned plasma physicists. Most of the examples are taken from laboratory plasma research, but the focus on principles makes the treatment useful to all experimental and theoretical plasma physicists, including those interested in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field. Specific areas of added coverage include neutral-beam-based diagnostics, flow measurement with mach probes, equilibrium of strongly shaped plasmas and fusion product diagnostics.

Principles Of Plasma Diagnostics

Author : I. H. Hutchinson
ISBN : 0521803896
Genre : Science
File Size : 57. 43 MB
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This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.

Principles Of Plasma Diagnostics

Author : I. H. Hutchinson
ISBN : 0521385830
Genre : Science
File Size : 55. 99 MB
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Principles of Plasma Diagnostics is the most modern and comprehensive book in its field. It joins for the first time a body of knowledge previously scattered throughout scientific literature. The text is based on first-principles development of the required concepts, so it is accessible to students and researchers with little plasma physics background. Nevertheless, even seasoned plasma physicists should find insight in the lucid development of the fundamentals as they apply to diagnostics and also appreciate the work as a valuable reference. Although most of the examples of diagnostics in action are taken from fusion research, the work's focus on principles will make it useful to all plasma physicists, those interested in space and astrophysical plasmas as well as laboratory plasmas, and theoreticians as well as experimenters themselves.

Principles Of Plasma Spectroscopy

Author : Hans R. Griem
ISBN : 0521619416
Genre : Science
File Size : 86. 49 MB
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A comprehensive description of theoretical foundations and experimental applications of spectroscopic methods in plasmas. It covers the classical and quantum theory of radiation, spectral line broadening, continuous spectra, thermodynamic relations, radiative energy transfer and losses, and applications of plasma spectroscopy to measurements of densities, magnetic and electric fields, and temperatures.

Lecture Notes On Principles Of Plasma Processing

Author : Francis F. Chen
ISBN : 9781461501817
Genre : Science
File Size : 64. 87 MB
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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Plasma Physics

Author : Alexander Piel
ISBN : 9783319634272
Genre : Science
File Size : 90. 54 MB
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The enlarged new edition of this textbook provides a comprehensive introduction to the basic processes in plasmas and demonstrates that the same fundamental concepts describe cold gas-discharge plasmas, space plasmas, and hot fusion plasmas. Starting from particle drifts in magnetic fields, the principles of magnetic confinement fusion are explained and compared with laser fusion. Collective processes are discussed in terms of plasma waves and instabilities. The concepts of plasma description by magnetohydrodynamics, kinetic theory, and particle simulation are stepwise introduced. Space charge effects in sheath regions, double layers and plasma diodes are given the necessary attention. The novel fundamental mechanisms of dusty plasmas are explored and integrated into the framework of conventional plasmas. The book concludes with a concise description of modern plasma discharges. Written by an internationally renowned researcher in experimental plasma physics, the text keeps the mathematical apparatus simple and emphasizes the underlying concepts. The guidelines of plasma physics are illustrated by a host of practical examples, preferentially from plasma diagnostics. There, Langmuir probe methods, laser interferometry, ionospheric sounding, Faraday rotation, and diagnostics of dusty plasmas are discussed. Though primarily addressing students in plasma physics, the book is easily accessible for researchers in neighboring disciplines, such as space science, astrophysics, material science, applied physics, and electrical engineering. This second edition has been thoroughly revised and contains substantially enlarged chapters on plasma diagnostics, dusty plasmas and plasma discharges. Probe techniques have been rearranged into basic theory and a host of practical examples for probe techniques in dc, rf, and space plasmas. New topics in dusty plasmas, such as plasma crystals, Yukawa balls, phase transitions and attractive forces have been adopted. The chapter on plasma discharges now contains a new section on conventional and high-power impulse magnetron sputtering. The recently discovered electrical asymmetry effect in capacitive rf-discharges is described. The text is based on an introductory course to plasma physics and advanced courses in plasma diagnostics, dusty plasmas, and plasma waves, which the author has taught at Kiel University for three decades. The pedagogical approach combines detailed explanations, a large number of illustrative figures, short summaries of the basics at the end of each chapter, and a selection of problems with detailed solutions.

Plasma Physics And Fusion Energy

Author : Jeffrey P. Freidberg
ISBN : 9781139462150
Genre : Science
File Size : 89. 52 MB
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There has been an increase in interest worldwide in fusion research over the last decade and a half due to the recognition that a large number of new, environmentally attractive, sustainable energy sources will be needed to meet ever increasing demand for electrical energy. Based on a series of course notes from graduate courses in plasma physics and fusion energy at MIT, the text begins with an overview of world energy needs, current methods of energy generation, and the potential role that fusion may play in the future. It covers energy issues such as the production of fusion power, power balance, the design of a simple fusion reactor and the basic plasma physics issues faced by the developers of fusion power. This book is suitable for graduate students and researchers working in applied physics and nuclear engineering. A large number of problems accumulated over two decades of teaching are included to aid understanding.

Handbook Of Advanced Plasma Processing Techniques

Author : R.J. Shul
ISBN : 9783642569890
Genre : Technology & Engineering
File Size : 51. 31 MB
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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Principles Of Plasma Discharges And Materials Processing

Author : Michael A. Lieberman
ISBN : 9780471724247
Genre : Science
File Size : 47. 70 MB
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A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Low Temperature Plasma Technology

Author : Paul K. Chu
ISBN : 9781466509900
Genre : Science
File Size : 42. 41 MB
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Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.

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